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X-ray photoelectron spectroscopy (XPS) study of Heusler alloy (Co2FeAl) interfaced with semiconductor (n-Si) structure Cover

X-ray photoelectron spectroscopy (XPS) study of Heusler alloy (Co2FeAl) interfaced with semiconductor (n-Si) structure

Materials Science-Poland
Volume 37 (2019): Issue 1 (March 2019)
By: Arvind Kumar and  P.C. Srivastava  
Open Access
|Mar 2019

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DOI: https://doi.org/10.2478/msp-2019-0001 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 116 - 121
Submitted on: Mar 29, 2018
Accepted on: Jul 25, 2018
Published on: Mar 6, 2019
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
Co2FeAl,
Heusler alloy,
XPS,
XRD,
silicides
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2019 Arvind Kumar, P.C. Srivastava, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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