X-ray photoelectron spectroscopy (XPS) study of Heusler alloy (Co2FeAl) interfaced with semiconductor (n-Si) structure
By: Arvind Kumar and P.C. Srivastava
DOI: https://doi.org/10.2478/msp-2019-0001 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331
Language: English
Page range: 116 - 121
Submitted on: Mar 29, 2018
Accepted on: Jul 25, 2018
Published on: Mar 6, 2019
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
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© 2019 Arvind Kumar, P.C. Srivastava, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.