Have a personal or library account? Click to login
X-ray photoelectron spectroscopy (XPS) study of Heusler alloy (Co2FeAl) interfaced with semiconductor (n-Si) structure Cover

X-ray photoelectron spectroscopy (XPS) study of Heusler alloy (Co2FeAl) interfaced with semiconductor (n-Si) structure

Materials Science-Poland
Volume 37 (2019): Issue 1 (March 2019)
By: Arvind Kumar and  P.C. Srivastava  
Open Access
|Mar 2019

Authors

Arvind Kumar

bhuarvind2512@gmail.com

Department of Physics, Atma Ram Sanatan Dharma College, University of Delhi, New Delhi, India
Department of Physics, Banaras Hindu University, Varanasi, India

P.C. Srivastava

Department of Physics, Banaras Hindu University, Varanasi, India
DOI: https://doi.org/10.2478/msp-2019-0001 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Journal RSS Feed
Language: English
Page range: 116 - 121
Submitted on: Mar 29, 2018
Accepted on: Jul 25, 2018
Published on: Mar 6, 2019
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
Co2FeAl,
Heusler alloy,
XPS,
XRD,
silicides
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2019 Arvind Kumar, P.C. Srivastava, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Previous articleVolume 37 (2019): Issue 1 (March 2019)Next article