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Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge Cover

Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge

By: A. Kavitha,  R. Kannan and  S. Rajashabala  
Open Access
|Feb 2017
DOI: https://doi.org/10.1515/msp-2017-0022 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 173 - 180
Submitted on: Jul 5, 2016
Accepted on: Jan 5, 2017
Published on: Feb 24, 2017
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2017 A. Kavitha, R. Kannan, S. Rajashabala, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.