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Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge
By: A. Kavitha, R. Kannan and S. Rajashabala
Language: English
Page range: 173 - 180
Submitted on: Jul 5, 2016
|Accepted on: Jan 5, 2017
|Published on: Feb 24, 2017
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
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© 2017 A. Kavitha, R. Kannan, S. Rajashabala, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.