Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge
By: A. Kavitha, R. Kannan and S. Rajashabala
Authors
A. Kavitha
kavithasep.venkatesan@gmail.com
Department of Physics, University College of Engineering, Anna University, Dindigul, India
R. Kannan
Department of Physics, University College of Engineering, Anna University, Dindigul, India
S. Rajashabala
School of Physics, Madurai Kamaraj University, Madurai, India
Language: English
Page range: 173 - 180
Submitted on: Jul 5, 2016
Accepted on: Jan 5, 2017
Published on: Feb 24, 2017
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Related subjects:
© 2017 A. Kavitha, R. Kannan, S. Rajashabala, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.