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Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge Cover

Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge

Materials Science-Poland
Volume 35 (2017): Issue 1 (March 2017)
By: A. Kavitha,  R. Kannan and  S. Rajashabala  
Open Access
|Feb 2017

Authors

A. Kavitha

kavithasep.venkatesan@gmail.com

Department of Physics, University College of Engineering, Anna University, Dindigul, India

R. Kannan

Department of Physics, University College of Engineering, Anna University, Dindigul, India

S. Rajashabala

School of Physics, Madurai Kamaraj University, Madurai, India
DOI: https://doi.org/10.1515/msp-2017-0022 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 173 - 180
Submitted on: Jul 5, 2016
|
Accepted on: Jan 5, 2017
|
Published on: Feb 24, 2017
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
Ti thin films,
supported discharge/triode mode,
DC magnetron sputtering,
target power
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2017 A. Kavitha, R. Kannan, S. Rajashabala, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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