Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge Cover

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Effect of target power on the physical properties of Ti thin films prepared by DC magnetron sputtering with supported discharge

Materials Science-Poland

Volume 35 (2017): Issue 1 (March 2017)

By: A. Kavitha, R. Kannan and S. Rajashabala

Open Access

|Feb 2017

Figures & Tables

(a) schematic diagram of DC magnetron sputtering with supported discharge, (b) electrical circuit diagram of the supported discharge.

Voltage-current characteristics in diode mode and triode mode at different filament bias currents.

Variation of target current with target voltage at a constant filament bias current of 1.0 A for different pressures.

Variation of thickness/rate of deposition on target power for the films deposited in diode and supported discharge modes, for dS−T = 4 cm.

EDS spectra for the Ti thin films deposited at (a) 3 Pa and (b) 0.7 Pa.

XRD patterns of Ti thin films deposited at a pressure of (a) 3 Pa, (b) 0.7 Pa at different target powers.

SEM images of Ti thin films deposited in diode mode at the target power of (a) 60 W, (b) 80 W, (c) 100 W and (d) 120 W.

Ti thin films deposited in triode mode at the target power of (a) 60 W, (b) 80 W, (c) 100 W and (d) 120 W.

AFM images of Ti films deposited in supported discharge system at the target power of (a) 60W, (b) 80 W, (c) 100 W and (d) 120 W.

Variation of electrical resistivity with target power of Ti thin films deposited in diode and triode mode.

Qualitative analysis of crystallite size_

Working pressure [Pa]	Target power [W]	Grain size [nm]	Relative intensity [%]	Surface roughness [nm]
	80	64	36	7
0.7	100	65	62	12
	120	80	100	15

	80	12	8	2
3	100	13	9	4
	120	20	12	5

DOI: https://doi.org/10.1515/msp-2017-0022 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331

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Language: English

Page range: 173 - 180

Submitted on: Jul 5, 2016

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Accepted on: Jan 5, 2017

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Published on: Feb 24, 2017

Published by: Wroclaw University of Science and Technology

In partnership with: Paradigm Publishing Services

Publication frequency: 4 issues per year

Keywords:

supported discharge/triode mode,

DC magnetron sputtering,

Related subjects:

Materials sciences,

Materials sciences, other,

Functional and smart materials,

Materials characterization and properties

© 2017 A. Kavitha, R. Kannan, S. Rajashabala, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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