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Fabrication and characterization of Si/SiO2/TiO2/ZnO heterostructures from sputtered and oxidized Ti-film Cover

Fabrication and characterization of Si/SiO2/TiO2/ZnO heterostructures from sputtered and oxidized Ti-film

Journal of Electrical Engineering
Volume 68 (2017): Issue 7 (December 2017)
By: Jaroslav Kováč,  Martin Florovič,  Andrej Vincze,  Edmund Dobročka,  Ivan Novotný,  Miroslav Mikolášek and  Jaroslava Škriniarová  
Open Access
|Dec 2017
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DOI: https://doi.org/10.1515/jee-2017-0057 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 58 - 61
Submitted on: Apr 23, 2017
Published on: Dec 29, 2017
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
SIS heterostructures,
thin films,
Ga-doped ZnO,
TiO,
Si,
SIMS,
characteristics,
spectroscopy
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2017 Jaroslav Kováč, Martin Florovič, Andrej Vincze, Edmund Dobročka, Ivan Novotný, Miroslav Mikolášek, Jaroslava Škriniarová, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

Volume 68 (2017): Issue 7 (December 2017)
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