Have a personal or library account? Click to login
Fabrication and characterization of Si/SiO2/TiO2/ZnO heterostructures from sputtered and oxidized Ti-film Cover

Fabrication and characterization of Si/SiO2/TiO2/ZnO heterostructures from sputtered and oxidized Ti-film

Open Access
|Dec 2017

Authors

Jaroslav Kováč

Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Bratislava, Slovakia

Martin Florovič

Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Bratislava, Slovakia

Andrej Vincze

International Laser Center Bratislava, Bratislava, Slovakia

Edmund Dobročka

Institute of Electrical Engineering, Slovak Academy of Sciences, Bratislava, Slovakia

Ivan Novotný

Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Bratislava, Slovakia

Miroslav Mikolášek

Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Bratislava, Slovakia

Jaroslava Škriniarová

jaroslav.kovac@stuba.sk

Institute of Electronics and Photonics, Slovak University of Technology in Bratislava, Bratislava, Slovakia
DOI: https://doi.org/10.1515/jee-2017-0057 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
Language: English
Page range: 58 - 61
Submitted on: Apr 23, 2017
|
Published on: Dec 29, 2017
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year

© 2017 Jaroslav Kováč, Martin Florovič, Andrej Vincze, Edmund Dobročka, Ivan Novotný, Miroslav Mikolášek, Jaroslava Škriniarová, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.