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Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process Cover

Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process

Open Access
|Dec 2012

References

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DOI: https://doi.org/10.2478/s13536-012-0058-4 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 323 - 328
Published on: Dec 14, 2012
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2012 K. Tadaszak, K. Nitsch, T. Piasecki, W. Posadowski, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.