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Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process
By: K. Tadaszak, K. Nitsch, T. Piasecki and W. Posadowski
Language: English
Page range: 323 - 328
Published on: Dec 14, 2012
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
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© 2012 K. Tadaszak, K. Nitsch, T. Piasecki, W. Posadowski, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.