Have a personal or library account? Click to login
Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process Cover

Properties of aluminium oxide thin films deposited in high effective reactive pulsed magnetron sputtering process

Materials Science-Poland
Volume 30 (2012): Issue 4 (December 2012)
By: K. Tadaszak,  K. Nitsch,  T. Piasecki and  W. Posadowski  
Open Access
|Dec 2012

Authors

K. Tadaszak

katarzyna.tadaszak@pwr.wroc.pl

K. Nitsch

T. Piasecki

W. Posadowski

DOI: https://doi.org/10.2478/s13536-012-0058-4 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Journal RSS Feed
Language: English
Page range: 323 - 328
Published on: Dec 14, 2012
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
impedance spectroscopy,
aluminium oxide,
reactive magnetron sputtering
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2012 K. Tadaszak, K. Nitsch, T. Piasecki, W. Posadowski, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Previous articleVolume 30 (2012): Issue 4 (December 2012)Next article