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Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO3 films Cover

Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO3 films

Open Access
|May 2020

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DOI: https://doi.org/10.2478/msp-2020-0001 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 41 - 47
Submitted on: Aug 17, 2017
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Accepted on: Apr 23, 2019
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Published on: May 8, 2020
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2020 S. Subbarayudu, K. Venkata Subba Reddy, S. Uthanna, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.