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Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO3 films Cover

Sputtering pressure influenced structural, electrical and optical properties of RF magnetron sputtered MoO3 films

Materials Science-Poland
Volume 38 (2020): Issue 1 (March 2020)
By: S. Subbarayudu,  K. Venkata Subba Reddy and  S. Uthanna  
Open Access
|May 2020

Authors

S. Subbarayudu

srsuguru.phy@gmail.com

Department of Physics, S.B.V.R. Degree College, India

K. Venkata Subba Reddy

Department of Physics, S.B.V.R. Degree College, India

S. Uthanna

Department of Physics, Sri Venkateswara University, Tirupati, India
DOI: https://doi.org/10.2478/msp-2020-0001 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 41 - 47
Submitted on: Aug 17, 2017
|
Accepted on: Apr 23, 2019
|
Published on: May 8, 2020
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
MoO thin films,
RF magnetron sputtering,
sputtering pressure,
structural properties,
optical properties
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2020 S. Subbarayudu, K. Venkata Subba Reddy, S. Uthanna, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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