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Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes Cover

Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes

Materials Science-Poland
Volume 36 (2018): Issue 4 (December 2018)
By: G.W. Strzelecki,  K. Nowakowska-Langier,  R. Chodun,  S. Okrasa,  B. Wicher and  K. Zdunek  
Open Access
|Feb 2019
DOI: https://doi.org/10.2478/msp-2018-0078 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 697 - 703
Submitted on: Nov 29, 2017
Accepted on: Jul 16, 2018
Published on: Feb 1, 2019
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
pulsed magnetron sputtering,
pulse plasma,
modulation frequency,
metallic films,
ceramic films
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2019 G.W. Strzelecki, K. Nowakowska-Langier, R. Chodun, S. Okrasa, B. Wicher, K. Zdunek, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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