Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes
Authors
K. Nowakowska-Langier
National Centre for Nuclear Research, Otwock, Poland
R. Chodun
Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland
S. Okrasa
Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland
B. Wicher
Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland
K. Zdunek
Faculty of Materials Science and Engineering, Warsaw University of Technology, Warsaw, Poland
Language: English
Page range: 697 - 703
Submitted on: Nov 29, 2017
Accepted on: Jul 16, 2018
Published on: Feb 1, 2019
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
Related subjects:
© 2019 G.W. Strzelecki, K. Nowakowska-Langier, R. Chodun, S. Okrasa, B. Wicher, K. Zdunek, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.