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Thickness and tensile stress determination of black silicon layers by spectral reflectance and Raman scattering Cover

Thickness and tensile stress determination of black silicon layers by spectral reflectance and Raman scattering

Open Access
|Sep 2019

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DOI: https://doi.org/10.2478/jee-2019-0041 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
Language: English
Page range: 51 - 57
Submitted on: Mar 19, 2019
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Published on: Sep 28, 2019
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year

© 2019 Martin Králik, Stanislav Jurečka, Emil Pinčík, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.