Thickness and tensile stress determination of black silicon layers by spectral reflectance and Raman scattering
By: Martin Králik, Stanislav Jurečka and Emil Pinčík
Authors
Martin Králik
Institute of Aurel Stodola, Faculty of Electrical Engineering, University of Žilina, Liptovský Mikuláš, Slovakia
Stanislav Jurečka
Institute of Aurel Stodola, Faculty of Electrical Engineering, University of Žilina, Liptovský Mikuláš, Slovakia
Emil Pinčík
Institute of Physics, Slovak Academy of Sciences, Bratislava, Slovakia
Language: English
Page range: 51 - 57
Submitted on: Mar 19, 2019
Published on: Sep 28, 2019
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
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© 2019 Martin Králik, Stanislav Jurečka, Emil Pinčík, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.