Electron Beam Lithography Double Step Exposure Technique for Fabrication of Mushroom-Like Profile in Bilayer Resist System
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DOI: https://doi.org/10.2478/jee-2014-0062 | Journal eISSN: 1339-309X (formerly 1335-3632) | Journal ISSN: 1335-3632
Language: English
Page range: 381 - 385
Submitted on: Jun 15, 2014
Published on: Jan 31, 2015
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
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© 2015 Indykiewicz Kornelia, Paszkiewicz Bogdan, Szymański Tomasz, Paszkiewicz Regina, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.