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Electron Beam Lithography Double Step Exposure Technique for Fabrication of Mushroom-Like Profile in Bilayer Resist System Cover

Electron Beam Lithography Double Step Exposure Technique for Fabrication of Mushroom-Like Profile in Bilayer Resist System

Journal of Electrical Engineering
Volume 65 (2014): Issue 6 (November 2014)
By: Indykiewicz Kornelia,  Paszkiewicz Bogdan,  Szymański Tomasz and  Paszkiewicz Regina  
Open Access
|Jan 2015

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DOI: https://doi.org/10.2478/jee-2014-0062 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 381 - 385
Submitted on: Jun 15, 2014
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Published on: Jan 31, 2015
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
T-shape resist profile,
mushroom-like resist profile,
bilayer resist system,
resist exposure model,
MC simulations,
e-beam lithography,
double step exposure
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2015 Indykiewicz Kornelia, Paszkiewicz Bogdan, Szymański Tomasz, Paszkiewicz Regina, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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