The influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD method

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Open Access

|Jun 2018

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DOI: https://doi.org/10.1515/msp-2018-0038 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331

Language: English

Page range: 264 - 269

Submitted on: Mar 18, 2017

Accepted on: Mar 15, 2018

Published on: Jun 25, 2018

In partnership with: Paradigm Publishing Services

Publication frequency: 4 issues per year

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© 2018 Mieczysław Szczypiński, Kazimierz Reszka, Michał M. Szczypiński, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.