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The influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD method Cover

The influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD method

Open Access
|Jun 2018

Authors

Mieczysław Szczypiński

PPHU TERMEX sp. z o.o.,, Koszalin, Poland

Kazimierz Reszka

Koszalin University of Technology, 75-453, Koszalin, Poland

Michał M. Szczypiński

michal.szczypinski@tul.cz

Technical University of Liberec, 461 17, Liberec, Czech Republic
DOI: https://doi.org/10.1515/msp-2018-0038 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 264 - 269
Submitted on: Mar 18, 2017
|
Accepted on: Mar 15, 2018
|
Published on: Jun 25, 2018
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2018 Mieczysław Szczypiński, Kazimierz Reszka, Michał M. Szczypiński, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.