The influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD method
Authors
Mieczysław Szczypiński
PPHU TERMEX sp. z o.o.,, Koszalin, Poland
Kazimierz Reszka
Koszalin University of Technology, 75-453, Koszalin, Poland
Michał M. Szczypiński
Technical University of Liberec, 461 17, Liberec, Czech Republic
Language: English
Page range: 264 - 269
Submitted on: Mar 18, 2017
Accepted on: Mar 15, 2018
Published on: Jun 25, 2018
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
Related subjects:
© 2018 Mieczysław Szczypiński, Kazimierz Reszka, Michał M. Szczypiński, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.