Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide
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Language: English
Page range: 69 - 74
Submitted on: Mar 24, 2017
Accepted on: Oct 11, 2017
Published on: May 18, 2018
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
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© 2018 Witold Posadowski, Artur Wiatrowski, Grzegorz Kapka, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.