Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide Cover

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Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide

Materials Science-Poland

Volume 36 (2018): Issue 1 (March 2018)

By: Witold Posadowski, Artur Wiatrowski and Grzegorz Kapka

Open Access

|May 2018

References

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[2] GEETHA PRIYADARSHINI B., AICH S., CHAKRABORTY M., J. Mater. Sci., 46 (2011), 2860.
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[3] MALLIKARJUNA REDDY A., SIVASANKAR REDDY A., SREEDHARA REDDY P., Mater. Chem. Phys., 125 (2011), 434.
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[4] ASHOK KUMAR REDDY Y., MALLIKARJUNA REDDY A., SIVASANKAR REDDY A., SREEDHARA REDDY P., J. Nano Electron. Phys., 4 (4) (2012), 04002/1.
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DOI: https://doi.org/10.1515/msp-2017-0092 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331

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Language: English

Page range: 69 - 74

Submitted on: Mar 24, 2017

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Accepted on: Oct 11, 2017

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Published on: May 18, 2018

Published by: Wroclaw University of Science and Technology

In partnership with: Paradigm Publishing Services

Publication frequency: 4 issues per year

Keywords:

pulsed magnetron sputtering,

Related subjects:

Materials sciences,

Materials sciences, other,

Functional and smart materials,

Materials characterization and properties

© 2018 Witold Posadowski, Artur Wiatrowski, Grzegorz Kapka, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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