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Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide Cover

Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide

Materials Science-Poland
Volume 36 (2018): Issue 1 (March 2018)
By: Witold Posadowski,  Artur Wiatrowski and  Grzegorz Kapka  
Open Access
|May 2018

Authors

Witold Posadowski

witold.posadowski@pwr.edu.pl

Faculty of Microsystem Electronics and Photonics,, Wroclaw, Poland

Artur Wiatrowski

Faculty of Microsystem Electronics and Photonics,, Wroclaw, Poland

Grzegorz Kapka

Faculty of Microsystem Electronics and Photonics,, Wroclaw, Poland
DOI: https://doi.org/10.1515/msp-2017-0092 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 69 - 74
Submitted on: Mar 24, 2017
|
Accepted on: Oct 11, 2017
|
Published on: May 18, 2018
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
pulsed magnetron sputtering,
thin film,
deposition,
nickel,
nickel oxide
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2018 Witold Posadowski, Artur Wiatrowski, Grzegorz Kapka, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.

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