Effect of pulsed magnetron sputtering process for the deposition of thin layers of nickel and nickel oxide
Authors
Witold Posadowski
Faculty of Microsystem Electronics and Photonics,, Wroclaw, Poland
Artur Wiatrowski
Faculty of Microsystem Electronics and Photonics,, Wroclaw, Poland
Grzegorz Kapka
Faculty of Microsystem Electronics and Photonics,, Wroclaw, Poland
Language: English
Page range: 69 - 74
Submitted on: Mar 24, 2017
Accepted on: Oct 11, 2017
Published on: May 18, 2018
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
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© 2018 Witold Posadowski, Artur Wiatrowski, Grzegorz Kapka, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.