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Effect of electron beam injection on boron redistribution in silicon and oxide layer
By: Shiqiang Qin, Yi Tan, Jiayan Li, Dachuan Jiang, Shutao Wen and Shuang Shi
Language: English
Page range: 14 - 17
Submitted on: Feb 29, 2016
Accepted on: Jan 15, 2017
Published on: Feb 24, 2017
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
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© 2017 Shiqiang Qin, Yi Tan, Jiayan Li, Dachuan Jiang, Shutao Wen, Shuang Shi, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.