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Effect of electron beam injection on boron redistribution in silicon and oxide layer Cover

Effect of electron beam injection on boron redistribution in silicon and oxide layer

Open Access
|Feb 2017

Authors

Shiqiang Qin

School of Materials Science and Engineering, Dalian University of Technology, Dalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning Province, Dalian, China

Yi Tan

School of Materials Science and Engineering, Dalian University of Technology, Dalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning Province, Dalian, China

Jiayan Li

lnsolar@dlut.edu.cn

School of Materials Science and Engineering, Dalian University of Technology, Dalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning Province, Dalian, China

Dachuan Jiang

School of Materials Science and Engineering, Dalian University of Technology, Dalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning Province, Dalian, China

Shutao Wen

School of Materials Science and Engineering, Dalian University of Technology, Dalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning Province, Dalian, China

Shuang Shi

School of Materials Science and Engineering, Dalian University of Technology, Dalian, China
Key Laboratory for Solar Energy Photovoltaic System of Liaoning Province, Dalian, China
DOI: https://doi.org/10.1515/msp-2017-0027 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 14 - 17
Submitted on: Feb 29, 2016
Accepted on: Jan 15, 2017
Published on: Feb 24, 2017
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2017 Shiqiang Qin, Yi Tan, Jiayan Li, Dachuan Jiang, Shutao Wen, Shuang Shi, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.