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Preliminary comparison of three processes of AlN oxidation: dry, wet and mixed ones Cover

Preliminary comparison of three processes of AlN oxidation: dry, wet and mixed ones

By:  and    
Open Access
|Apr 2016

Figures & Tables

Fig. 1

Schematic diagram of the used thermal oxidation system.

Fig. 2

Schematic view of the mathematical model system.

Fig. 3

Morphology of the oxidized AlN/Si surfaces.

Fig. 4

Mathematical model fit to the results obtained by ellipsometry measurements: (a) amplitude ratio Y and (b) phase difference D for sample X (not oxidized AlN/Si).

Fig. 5

Mathematical model fits to the results obtained by ellipsometry measurements: (a) amplitude ratio Ψ and (b) phase difference ∆ for sample As19.

Fig. 6

Relationship between wavelength and refractive indices for all series of oxidation: (a) dry, (b) wet, (c) mixed.

Fig. 7

EDS counts for sample As19 (oxidation time: 10 min, 5 kV).

Fig. 8

Diagram of oxidation time vs. atomic contents of nitrogen and oxygen.

Results obtained from SE for the oxidized structures (wet type)_

SampleThermal oxidationAlN CauchyAlN Cauchy + VoidAl2O3 + VoidMSE
time [min]Thickness [nm]Thickness [nm]Void [%]Thickness [nm]Void[%]
test_ aln01814451010018.34
As3710454110404116.39
As39301166211492721.32
As385078879581923.93
As401004011412821021.24

Results obtained from SE for the oxidized structures (dry type)_

SampleThermal oxidationAlN CauchyAlN Cauchy + VoidAl2O3 + VoidMSE
time [min]Thickness [nm]Thickness [nm]Void [%]Thickness [nm]Void[%]
test_ aln01814451010018.34
As33101544512384416.13
As34301404710444319.02
As35501344811454419.17
As36100105688513823.91

Results obtained from SE for the oxidized structures (mixed type)_

SampleThermal oxidationAlN CauchyAlN Cauchy + VoidAl2O3 + VoidMSE
time [min]Thickness [nm]Thickness [nm]Void [%]Thickness [nm]Void [%]
X02136253.101008.62
As19101407213.25929.27.349
As2120989311.27619.713.9
As230481078.712417.612.69
As224001317.916515.817.1
As205001057.218715.312.23
DOI: https://doi.org/10.1515/msp-2016-0010 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 157 - 163
Submitted on: Aug 16, 2016
Accepted on: Nov 16, 2016
Published on: Apr 27, 2016
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2016 R. Korbutowicz, A. Zakrzewski, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.