Preliminary comparison of three processes of AlN oxidation: dry, wet and mixed ones

R. Korbutowicz; A. Zakrzewski

doi:10.1515/msp-2016-0010

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Preliminary comparison of three processes of AlN oxidation: dry, wet and mixed ones

Materials Science-Poland

Volume 34 (2016): Issue 1 (March 2016)

By: R. Korbutowicz and A. Zakrzewski

Open Access

|Apr 2016

Figures & Tables

Schematic diagram of the used thermal oxidation system.

Schematic view of the mathematical model system.

Morphology of the oxidized AlN/Si surfaces.

Mathematical model fit to the results obtained by ellipsometry measurements: (a) amplitude ratio Y and (b) phase difference D for sample X (not oxidized AlN/Si).

Mathematical model fits to the results obtained by ellipsometry measurements: (a) amplitude ratio Ψ and (b) phase difference ∆ for sample As19.

Table 1

Results obtained from SE for the oxidized structures (dry type).

Sample	Thermal oxidation	AlN Cauchy	AlN Cauchy + Void		Al₂O₃ + Void		MSE
Sample	time [min]	Thickness [nm]	Thickness [nm]	Void [%]	Thickness [nm]	Void[%]	MSE
test_ aln	0	181	44	51	0	100	18.34
As33	10	154	45	12	38	44	16.13
As34	30	140	47	10	44	43	19.02
As35	50	134	48	11	45	44	19.17
As36	100	105	68	8	51	38	23.91

Table 2

Results obtained from SE for the oxidized structures (wet type).

Sample	Thermal oxidation	AlN Cauchy	AlN Cauchy + Void		Al₂O₃ + Void		MSE
Sample	time [min]	Thickness [nm]	Thickness [nm]	Void [%]	Thickness [nm]	Void[%]	MSE
test_ aln	0	181	44	51	0	100	18.34
As37	10	45	41	10	40	41	16.39
As39	30	116	62	11	49	27	21.32
As38	50	78	87	9	58	19	23.93
As40	100	40	114	12	82	10	21.24

Table 3

Results obtained from SE for the oxidized structures (mixed type).

Sample	Thermal oxidation	AlN Cauchy	AlN Cauchy + Void		Al₂O₃ + Void		MSE
Sample	time [min]	Thickness [nm]	Thickness [nm]	Void [%]	Thickness [nm]	Void [%]	MSE
X	0	213	62	53.1	0	100	8.62
As19	10	140	72	13.2	59	29.2	7.349
As21	20	98	93	11.2	76	19.7	13.9
As2	30	48	107	8.7	124	17.6	12.69
As22	40	0	131	7.9	165	15.8	17.1
As20	50	0	105	7.2	187	15.3	12.23

Relationship between wavelength and refractive indices for all series of oxidation: (a) dry, (b) wet, (c) mixed.

EDS counts for sample As19 (oxidation time: 10 min, 5 kV).

Diagram of oxidation time vs. atomic contents of nitrogen and oxygen.

References

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Articles in this issue

DOI: https://doi.org/10.1515/msp-2016-0010 | Journal eISSN: 2083-134X (formerly 2083-124X) | Journal ISSN: 2083-1331

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Language: English

Page range: 157 - 163

Submitted on: Aug 16, 2016

Accepted on: Nov 16, 2016

Published on: Apr 27, 2016

Published by: Wroclaw University of Science and Technology

In partnership with: Paradigm Publishing Services

Keywords:

thermal oxidation,

AlN,

Al₂O₃,

AlON,

EDS,

Related subjects:

Materials sciences,

Materials sciences, other,

Nanomaterials,

Functional and smart materials,

Materials characterization and properties

© 2016 R. Korbutowicz, A. Zakrzewski, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Volume 34 (2016): Issue 1 (March 2016)

Preliminary comparison of three processes of AlN oxidation: dry, wet and mixed ones

Figures & Tables

Fig. 1

Fig. 2

Fig. 3

Fig. 4

Fig. 5

Table 1

Table 2

Table 3

Fig. 6

Fig. 7

Fig. 8

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