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The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis Cover

The application of magnetic self-filter to optimization of AIN film growth process during the impulse plasma deposition synthesis

Materials Science-Poland
Volume 34 (2016): Issue 1 (March 2016)
By:
Open Access
|Apr 2016

Figures & Tables

Fig. 1

Schematic diagram of the apparatus used in the experiment (A), wiring diagram of the coil connected with plasma accelerator (B) and photograph of the coil coupled with accelerator installed in the vacuum chamber.
Schematic diagram of the apparatus used in the experiment (A), wiring diagram of the coil connected with plasma accelerator (B) and photograph of the coil coupled with accelerator installed in the vacuum chamber.

Fig. 2

Photograph of full single plasma pack guided by the bent down coil of filter.
Photograph of full single plasma pack guided by the bent down coil of filter.

Fig. 3

Comparison of optical spectrum of magnetically filtered impulse plasma (red) with optical spectrum of plasma generated at standard apparatus of IPD method (blue).
Comparison of optical spectrum of magnetically filtered impulse plasma (red) with optical spectrum of plasma generated at standard apparatus of IPD method (blue).

Fig. 4

Raman spectra of AlN films deposited on silicon substrates during the experiment with magnetic filtering (top) and without filtering (bottom).
Raman spectra of AlN films deposited on silicon substrates during the experiment with magnetic filtering (top) and without filtering (bottom).

Fig. 5

Surface images of AlN films deposited by a standard apparatus (A) and by the apparatus with the filter coupled with accelerator.
Surface images of AlN films deposited by a standard apparatus (A) and by the apparatus with the filter coupled with accelerator.

Fig. 6

SEM photographs of AlN films structures deposited during the processes with the standard accelerator (left column) and using a plasma filtering (right column).
SEM photographs of AlN films structures deposited during the processes with the standard accelerator (left column) and using a plasma filtering (right column).
DOI: https://doi.org/10.1515/msp-2016-0007 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 126 - 131
Submitted on: Jul 21, 2015
Accepted on: Nov 16, 2015
Published on: Apr 27, 2016
Published by: Sciendo
In partnership with: Paradigm Publishing Services
Publication frequency: 4 times per year
Keywords:
IPD method,
magnetic filter,
nanocrystalline films,
thin films
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2016 Rafal Chodun, Katarzyna Nowakowska-Langier, Sebastian Okrasa, Krzysztof Zdunek, published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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