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Surface morphology of titanium nitride thin films synthesized by DC reactive magnetron sputtering

Materials Science-Poland
Volume 33 (2015): Issue 1 (March 2015)
By:
Open Access
|Mar 2015

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DOI: https://doi.org/10.1515/msp-2015-0010 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 137 - 143
Submitted on: Jul 25, 2014
Accepted on: Oct 7, 2014
Published on: Mar 13, 2015
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
atomic force microscopy (AFM),
DC reactive magnetron sputtering,
fractal analysis,
surface roughness,
titanium nitride (TiN) thin film
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2015 Ştefan Ţǎlu, Sebastian Stach, Shahoo Valedbagi, S. Mohammad Elahi, Reza Bavadi, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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