Fabrication and characterization of Si/SiO2/TiO2/ZnO heterostructures from sputtered and oxidized Ti-film
Kováč, Jaroslav, Florovič, Martin, Vincze, Andrej, Dobročka, Edmund, Novotný, Ivan, Mikolášek, Miroslav, Škriniarová, Jaroslava
Electrical Properties of Recessed Algan/Gan Schottky Diodes Under off–State Stress
Florovič, Martin, Kováč, Jaroslav, Benko, Peter, Chvála, Aleš, Škriniarová, Jaroslava, Kordó, Peter
Far Field Measurements of Phc Led Prepared by E–Beam Lithography
Hronec, Pavol, Škriniarová, Jaroslava, Benčurová, Anna, Nemec, Pavol, Pudiš, Dušan, Kováč, Jaroslav
The AZ 5214E Resist in EBDW Lithography and its Use as a RIE Etch–Mask in Etching Thin Ag Layers in N2 Plasma
Andok, Robert, Benčurová, Anna, Nemec, Pavol, Konečníková, Anna, Matay, Ladislav, Škriniarová, Jaroslava, Hrkút, Pavol