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Deposition velocity of H2: a new algorithm for its dependence on soil moisture and temperature Cover

Deposition velocity of H2: a new algorithm for its dependence on soil moisture and temperature

Open Access
|Jan 2013

Abstract

We derive an analytical expression for the deposition velocity of H2 on soil, vd, which explicitly describes the dependence of vd on the average soil moisture, Θw, and temperature, T. It is based on the solution of the equation for vertical diffusion in a two-layer soil model consisting of a dry top layer of a depth, δ, free of H2 removal, and a moist deeper layer with a uniform H2 removal rate constant. The dependence of δ on Θw is derived from modelled vertical profiles of Θw. The resulting dependence of vd on is compared to the previously used vdw ) derived from a single-layer model, i.e. one without a dry top layer, and with a set of vd from field measurements. The implications are discussed.

Language: English
Page range: 19904 - 19904
Submitted on: Oct 17, 2012
Accepted on: Jan 22, 2013
Published on: Jan 1, 2013
Published by: Stockholm University Press
In partnership with: Paradigm Publishing Services

© 2013 Dieter H. Ehhalt, Franz Rohrer, published by Stockholm University Press
This work is licensed under the Creative Commons Attribution 4.0 License.