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Hydrogenated amorphous silicon carbon nitride films prepared by PECVD technology: properties
By: Jozef Huran, Albín Valovič, Michal Kučera, Angela Kleinová, Eva Kovačcová, Pavol Boháček and Mária Sekáčová
Open Access
|Nov 2012Language: English
Page range: 333 - 335
Published on: Nov 20, 2012
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
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© 2012 Jozef Huran, Albín Valovič, Michal Kučera, Angela Kleinová, Eva Kovačcová, Pavol Boháček, Mária Sekáčová, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons License.