Temperature measurement using a Chx/porous silicon/Si structure encapsulated in a CO2 rich environment
By: A. Chiali, N. Ghellai, N. Gabouze and N. Sari
Open Access
|Aug 2010References
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Language: English
Page range: 4 - 10
Published on: Aug 26, 2010
Published by: Gdansk University of Technology
In partnership with: Paradigm Publishing Services
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© 2010 A. Chiali, N. Ghellai, N. Gabouze, N. Sari, published by Gdansk University of Technology
This work is licensed under the Creative Commons License.