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Temperature measurement using a Chx/porous silicon/Si structure encapsulated in a CO2 rich environment Cover

Temperature measurement using a Chx/porous silicon/Si structure encapsulated in a CO2 rich environment

By: A. Chiali,  N. Ghellai,  N. Gabouze and  N. Sari  
Open Access
|Aug 2010
DOI: https://doi.org/10.2478/v10077-010-0005-1 | Journal eISSN: 2083-4799 | Journal ISSN: 1730-2439
Language: English
Page range: 4 - 10
Published on: Aug 26, 2010
Published by: Gdansk University of Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2010 A. Chiali, N. Ghellai, N. Gabouze, N. Sari, published by Gdansk University of Technology
This work is licensed under the Creative Commons License.

Volume 10 (2010): Issue 2 (June 2010)