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Temperature measurement using a Chx/porous silicon/Si structure encapsulated in a CO2 rich environment Cover

Temperature measurement using a Chx/porous silicon/Si structure encapsulated in a CO2 rich environment

By: A. Chiali,  N. Ghellai,  N. Gabouze and  N. Sari  
Open Access
|Aug 2010

Abstract

This work reports on the possible use of microporous silicon as a temperature sensor. This work is based on previous published works [7, 8, and 9]. The device is based on hydrocarbon group (CHx) / porous silicon (PS) /Si structure. The porous sample was coated with hydrocarbons groups deposited by the plasma of methane /argon mixture. Current-voltage characteristics have been investigated as a function of temperature in the range 20°C-70°C. The results show that for a constant voltage in the range 0.7-1V, the current increases linearly with the environment temperature reaches a maximum at 70°C and then stabilizes. This result suggests that the developed structure can be used for sensing temperatures not exceeding 70°C.

DOI: https://doi.org/10.2478/v10077-010-0005-1 | Journal eISSN: 2083-4799 | Journal ISSN: 1730-2439
Language: English
Page range: 4 - 10
Published on: Aug 26, 2010
Published by: Gdansk University of Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year

© 2010 A. Chiali, N. Ghellai, N. Gabouze, N. Sari, published by Gdansk University of Technology
This work is licensed under the Creative Commons License.

Volume 10 (2010): Issue 2 (June 2010)