Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering

Materials Science-Poland

Volume 32 (2014): Issue 3 (September 2014)

By:

Michal Mazur, Danuta Kaczmarek, Eugeniusz Prociow, Jaroslaw Domaradzki, Damian Wojcieszak and Jakub Bocheński

Open Access

|Oct 2014

DOI: https://doi.org/10.2478/s13536-013-0195-4 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331

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Language: English

Page range: 457 - 464

Published on: Oct 17, 2014

Published by: Wroclaw University of Science and Technology

In partnership with: Paradigm Publishing Services

Publication frequency: 4 issues per year

Keywords:

(Ti,Nb)Ox thin films,

transparent oxide semiconductor,

p-type electrical conduction,

niobium doped titanium dioxide,

transparent electronics

Related subjects:

Materials sciences,

Materials sciences, other,

Functional and smart materials,

Materials characterization and properties

© 2014 Michal Mazur, Danuta Kaczmarek, Eugeniusz Prociow, Jaroslaw Domaradzki, Damian Wojcieszak, Jakub Bocheński, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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