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Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering Cover

Investigation of structural, optical and electrical properties of (Ti,Nb)Ox thin films deposited by high energy reactive magnetron sputtering

Materials Science-Poland
Volume 32 (2014): Issue 3 (September 2014)
By: Michal Mazur,  Danuta Kaczmarek,  Eugeniusz Prociow,  Jaroslaw Domaradzki,  Damian Wojcieszak and  Jakub Bocheński  
Open Access
|Oct 2014

Authors

Michal Mazur

michal.mazur@pwr.wroc.pl

Danuta Kaczmarek

Eugeniusz Prociow

Jaroslaw Domaradzki

Damian Wojcieszak

Jakub Bocheński

DOI: https://doi.org/10.2478/s13536-013-0195-4 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 457 - 464
Published on: Oct 17, 2014
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
(Ti,Nb)Ox thin films,
transparent oxide semiconductor,
p-type electrical conduction,
niobium doped titanium dioxide,
transparent electronics
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2014 Michal Mazur, Danuta Kaczmarek, Eugeniusz Prociow, Jaroslaw Domaradzki, Damian Wojcieszak, Jakub Bocheński, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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