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Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method Cover

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Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method

Materials Science-Poland

Volume 32 (2014): Issue 2 (June 2014)

By: Krzysztof Zdunek, Katarzyna Nowakowska-Langier, Rafal Chodun, Jerzy Dora, Sebastian Okrasa and Ewa Talik

Open Access

|Jul 2014

Articles in this issue

DOI: https://doi.org/10.2478/s13536-013-0169-6 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331

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Language: English

Page range: 171 - 175

Published on: Jul 22, 2014

Published by: Wroclaw University of Science and Technology

In partnership with: Paradigm Publishing Services

Publication frequency: 4 issues per year

Keywords:

plasma surface engineering,

magnetron sputtering,

aluminum nitride deposition

Related subjects:

Materials sciences,

Materials sciences, other,

Functional and smart materials,

Materials characterization and properties

© 2014 Krzysztof Zdunek, Katarzyna Nowakowska-Langier, Rafal Chodun, Jerzy Dora, Sebastian Okrasa, Ewa Talik, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Volume 32 (2014): Issue 2 (June 2014)

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