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Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method Cover

Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method

Materials Science-Poland
Volume 32 (2014): Issue 2 (June 2014)
By: Krzysztof Zdunek,  Katarzyna Nowakowska-Langier,  Rafal Chodun,  Jerzy Dora,  Sebastian Okrasa and  Ewa Talik  
Open Access
|Jul 2014

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DOI: https://doi.org/10.2478/s13536-013-0169-6 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
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Language: English
Page range: 171 - 175
Published on: Jul 22, 2014
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
plasma surface engineering,
magnetron sputtering,
aluminum nitride deposition
Related subjects:
Materials sciences,
Materials sciences, other,
Nanomaterials,
Functional and smart materials,
Materials characterization and properties

© 2014 Krzysztof Zdunek, Katarzyna Nowakowska-Langier, Rafal Chodun, Jerzy Dora, Sebastian Okrasa, Ewa Talik, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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