Residual doses and sensitivity change of post IR IRSL signals from potassium feldspar under different bleaching conditions
By: Yiwei Chen, Sheng-Hua Li and Bo Li
DOI: https://doi.org/10.2478/s13386-013-0128-3 | Journal eISSN: 1897-1695
Language: English
Page range: 229 - 238
Published on: Sep 27, 2013
Published by: Sciendo
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year
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© 2013 Yiwei Chen, Sheng-Hua Li, Bo Li, published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.