Residual doses and sensitivity change of post IR IRSL signals from potassium feldspar under different bleaching conditions
By: Yiwei Chen, Sheng-Hua Li and Bo Li
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Language: English
Page range: 229 - 238
Published online: Sep 27, 2013
Published in print: Dec 1, 2013
Published by: Sciendo
In partnership with: Paradigm Publishing Services
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© 2013 Yiwei Chen, Sheng-Hua Li, Bo Li, published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.