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Residual doses and sensitivity change of post IR IRSL signals from potassium feldspar under different bleaching conditions Cover

Residual doses and sensitivity change of post IR IRSL signals from potassium feldspar under different bleaching conditions

By: Yiwei Chen,  Sheng-Hua Li and  Bo Li  
Open Access
|Sep 2013

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Language: English
Page range: 229 - 238
Published on: Sep 27, 2013
Published by: Sciendo
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year

© 2013 Yiwei Chen, Sheng-Hua Li, Bo Li, published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.