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Residual doses and sensitivity change of post IR IRSL signals from potassium feldspar under different bleaching conditions Cover

Residual doses and sensitivity change of post IR IRSL signals from potassium feldspar under different bleaching conditions

By: Yiwei Chen,  Sheng-Hua Li and  Bo Li  
Open Access
|Sep 2013

Abstract

The residual doses and sensitivity change for potassium-rich feldspar (K-feldspar) have been studied using the post-infrared infrared stimulated luminescence (pIRIR) and multi-elevated-temperature post-IR IRSL (MET-pIRIR) protocols. Laboratory simulated poorly-bleached and well-bleached samples were those K-feldspar grains bleached using a solar simulator for 10 minutes and 8 hours, respectively. The residual doses rise with stimulation temperature and time. The poorly-bleached sample has larger residual doses than the well-bleached sample, especially at high stimulation temperatures. The high-temperature pIRIR signals contain a large amount of hard-to-bleach signals. A decrease of luminescence sensitivity was observed after conducting a high-temperature-treatment in the measurement cycles. The sensitivity decreases significantly between the first and the second cycle. The extent of decrease in sensitivity shows a clear temperature trend. The higher the stimulation temperature of pIRIR signals is, the larger the sensitivity decreases. This decrease is more severe for the poorly-bleached sample than for the well-bleached sample, and could possibly lead to problems in sensitivity correction.

Language: English
Page range: 229 - 238
Published on: Sep 27, 2013
Published by: Sciendo
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year

© 2013 Yiwei Chen, Sheng-Hua Li, Bo Li, published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.