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Fig. 18.
Results of thermal measurements for planar platinum structures
| Supply current I [A] | Supply voltage U [V] | Power P [W] | Structure temp. Without shutter T [°C] | Structure temp. with shutter TSi [°C] = T·0.66925 |
|---|---|---|---|---|
| Measurement with rapid temperature rise | ||||
| 0.33 | 3.05 | 1.01 | 150 | 100.39 |
| 0.39 | 3.94 | 1.54 | 200 | 133.85 |
| 0.46 | 5.43 | 2.48 | 300 | 200.78 |
| 0.50 | 6.83 | 3.41 | 400 | 267.70 |
| 0.55 | 8.42 | 4.63 | 500 | 334.63 |
| Measurement with slow temperature rise | ||||
| 0.35 | 2.847 | 0.99645 | 150 | 100.39 |
| 0.39 | 3.44 | 1.33 | 200 | 133.85 |
| 0.46 | 4.73 | 2.15 | 300 | 200.78 |
| 0.51 | 6.02 | 3.06 | 400 | 267.70 |
| 0.56 | 7.52 | 4.24 | 500 | 334.63 |
| 0.611 | 9.00 | 5.50 | 600 | 401.55 |
| 0.66 | 10.70 | 7.09 | 700 | 468.48 |
Calibration measurements for silicon shutter bench
| Supply current I [A] | Supply voltage U [V] | Power P [W] | Structure temp. without shutter T [°C] | Structure temp. with shutter TSi [°C] | Loss rate TSi/T [%] |
|---|---|---|---|---|---|
| 0.33 | 3.05 | 1.0065 | 150 | 97 | 64.7 |
| 0.386 | 3.94 | 1.52084 | 201 | 135 | 67.2 |
| 0.45 | 5.43 | 2.4435 | 300 | 206 | 68.7 |
| 0.5 | 7.02 | 3.51 | 402 | 272 | 67.1 |
| Mean | 66.925 | ||||
| Standard deviation | 1.654 |