Annealing effect on the structural and optoelectronic properties of Cu-Cr-O thin films deposited by reactive magnetron sputtering using a single CuCr target

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Open Access

|Aug 2023

Authors

Department of Materials Science and Engineering, National Chung Hsing University, Taiwan, Republic of China

Department of Materials Science and Engineering, National Chung Hsing University, Taiwan, Republic of China

Metal Industries Research and Development Centre, Taiwan, Republic of China

Department of Materials Science and Engineering, National Chung Hsing University, Taiwan, Republic of China

Department of Mechanical Engineering, National Chin-Yi University of Technology, Taiwan, Republic of China

DOI: https://doi.org/10.2478/msp-2023-0017 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331

Language: English

Page range: 191 - 201

Submitted on: May 15, 2023

Accepted on: Jul 13, 2023

Published on: Aug 25, 2023

Published by: Wroclaw University of Science and Technology

In partnership with: Paradigm Publishing Services

Publication frequency: 4 issues per year

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© 2023 Du-Cheng Tsai, Erh-Chiang Chen, Yen-Lin Huang, Fuh-Sheng Shieu, Zue-Chin Chang, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.