Have a personal or library account? Click to login
Annealing effect on the structural and optoelectronic properties of Cu-Cr-O thin films deposited by reactive magnetron sputtering using a single CuCr target Cover

Annealing effect on the structural and optoelectronic properties of Cu-Cr-O thin films deposited by reactive magnetron sputtering using a single CuCr target

Open Access
|Aug 2023

Authors

Du-Cheng Tsai

Department of Materials Science and Engineering, National Chung Hsing University, Taiwan, Republic of China

Erh-Chiang Chen

Department of Materials Science and Engineering, National Chung Hsing University, Taiwan, Republic of China

Yen-Lin Huang

Metal Industries Research and Development Centre, Taiwan, Republic of China

Fuh-Sheng Shieu

Department of Materials Science and Engineering, National Chung Hsing University, Taiwan, Republic of China

Zue-Chin Chang

chang@ncut.edu.tw

Department of Mechanical Engineering, National Chin-Yi University of Technology, Taiwan, Republic of China
DOI: https://doi.org/10.2478/msp-2023-0017 | Journal eISSN: 2083-134X | Journal ISSN: 2083-1331
Language: English
Page range: 191 - 201
Submitted on: May 15, 2023
Accepted on: Jul 13, 2023
Published on: Aug 25, 2023
Published by: Sciendo
In partnership with: Paradigm Publishing Services
Publication frequency: 4 times per year

© 2023 Du-Cheng Tsai, Erh-Chiang Chen, Yen-Lin Huang, Fuh-Sheng Shieu, Zue-Chin Chang, published by Sciendo
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.