Annealing effect on the structural and optoelectronic properties of Cu-Cr-O thin films deposited by reactive magnetron sputtering using a single CuCr target
Authors
Du-Cheng Tsai
Department of Materials Science and Engineering, National Chung Hsing University, Taiwan, Republic of China
Erh-Chiang Chen
Department of Materials Science and Engineering, National Chung Hsing University, Taiwan, Republic of China
Yen-Lin Huang
Metal Industries Research and Development Centre, Taiwan, Republic of China
Fuh-Sheng Shieu
Department of Materials Science and Engineering, National Chung Hsing University, Taiwan, Republic of China
Zue-Chin Chang
Department of Mechanical Engineering, National Chin-Yi University of Technology, Taiwan, Republic of China
Language: English
Page range: 191 - 201
Submitted on: May 15, 2023
Accepted on: Jul 13, 2023
Published on: Aug 25, 2023
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
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© 2023 Du-Cheng Tsai, Erh-Chiang Chen, Yen-Lin Huang, Fuh-Sheng Shieu, Zue-Chin Chang, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.