Analysis of surface properties of Ti-Cu-Ox gradient thin films using AFM and XPS investigations
Authors
Tomasz Kotwica
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Science and Technology, Wroclaw, Poland
Jaroslaw Domaradzki
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Science and Technology, Wroclaw, Poland
Damian Wojcieszak
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Science and Technology, Wroclaw, Poland
Andrzej Sikora
Department of Material Science and Diagnostics, Electrotechnical Institute, Wroclaw, Poland
Malgorzata Kot
Applied Physics-Sensor Technology, Brandenburg, University of Technology Cottbus-Senftenberg, Cottbus, Germany
Dieter Schmeisser
Applied Physics-Sensor Technology, Brandenburg, University of Technology Cottbus-Senftenberg, Cottbus, Germany
Language: English
Page range: 761 - 768
Submitted on: Nov 9, 2018
Accepted on: Nov 30, 2018
Published on: Feb 1, 2019
Published by: Wroclaw University of Science and Technology
In partnership with: Paradigm Publishing Services
Publication frequency: 4 issues per year
Keywords:
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© 2019 Tomasz Kotwica, Jaroslaw Domaradzki, Damian Wojcieszak, Andrzej Sikora, Malgorzata Kot, Dieter Schmeisser, published by Wroclaw University of Science and Technology
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 License.