ZnO-Thin Film Growth Processes: Correlation Between the Structural Properties of Hydrochloric Acid (HCl) and Water (H2O) Solution Effect Using Innovative Electrostatic Spray Deposition (ESd) Technology Cover

ZnO-Thin Film Growth Processes: Correlation Between the Structural Properties of Hydrochloric Acid (HCl) and Water (H2O) Solution Effect Using Innovative Electrostatic Spray Deposition (ESd) Technology

Latvian Journal of Physics and Technical Sciences

Volume 62 (2025): Issue 3 (June 2025)

By:

F. I. Abbas and M. Sugiyama

Open Access

|May 2025

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DOI: https://doi.org/10.2478/lpts-2025-0023 | Journal eISSN: 2255-8896 | Journal ISSN: 0868-8257

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Language: English

Page range: 68 - 76

Published on: May 27, 2025

Published by: Institute of Physical Energetics

In partnership with: Paradigm Publishing Services

Publication frequency: 6 times per year

Keywords:

lattice parameter,

positional parameter,

ZnO growth mechanism

Related subjects:

Technical and applied physics

© 2025 F. I. Abbas, M. Sugiyama, published by Institute of Physical Energetics
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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