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High-Throughput Resistance Phenotyping of Banana (Musa spp.) against Radopholus similis Cover

High-Throughput Resistance Phenotyping of Banana (Musa spp.) against Radopholus similis

Open Access
|Dec 2025

Abstract

Radopholus similis severely damages banana roots causing significant yield losses. Field screening for resistance is labor intensive and inconsistent due to environmental variation and mixed nematode populations. The screenhouse offers a controlled environment but is limited by the time needed for root development and variation in plant growth. We developed and validated a high-throughput in vitro method for phenotyping banana resistance to R. similis using sand-Murashige and Skoog (MS) media. Tissue culture plantlets grown in sterilized sand-MS were inoculated with 50 female R. similis after root development and nematodes extracted eight weeks after inoculation to calculate the reproduction factor (RF). Although RF values were higher for in vitro than in the screenhouse, accession responses showed similar trends under both conditions. The in vitro method was rapid, cost-effective with higher throughput, accelerating phenotyping and enabling rapid assessment of banana accessions for breeding programs. Some accessions responded differently to the two methods indicating that additional methods, such as root necrosis scores are important to confirm resistance. This study is the first in vitro-based demonstration of phenotyping for nematode resistance using modified sand-MS media with improved root development and pathogen interactions.

DOI: https://doi.org/10.2478/jofnem-2025-0055 | Journal eISSN: 2640-396X | Journal ISSN: 0022-300X
Language: English
Submitted on: May 27, 2025
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Published on: Dec 7, 2025
In partnership with: Paradigm Publishing Services
Publication frequency: 1 issue per year

© 2025 Joseph Kisitu, Kanan K. Saikai, Danny Coyne, Reagan Kanaabi, James Kisaakye, Rony Swennen, Gloria V. Nakato, published by Society of Nematologists, Inc.
This work is licensed under the Creative Commons Attribution 4.0 License.