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Functional nano-structuring of thin silicon nitride membranes Cover

Functional nano-structuring of thin silicon nitride membranes

Journal of Electrical Engineering
Volume 71 (2020): Issue 2 (April 2020)
By: Milan Matějka,  Stanislav Krátký,  Tomáš Řiháček,  Alexandr Knápek and  Vladimír Kolařík  
Open Access
|May 2020
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DOI: https://doi.org/10.2478/jee-2020-0019 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632
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Language: English
Page range: 127 - 130
Submitted on: Dec 19, 2019
Published on: May 13, 2020
Published by: Slovak University of Technology in Bratislava
In partnership with: Paradigm Publishing Services
Publication frequency: 6 issues per year
Keywords:
membrane,
nano optical device,
electron optics,
electron beam lithography,
silicon nitride,
reactive ion etching,
silicon etching,
microfabrication
Related subjects:
Engineering,
Introductions and overviews,
Engineering, other

© 2020 Milan Matějka, Stanislav Krátký, Tomáš Řiháček, Alexandr Knápek, Vladimír Kolařík, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

Volume 71 (2020): Issue 2 (April 2020)
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