Functional nano-structuring of thin silicon nitride membranes Cover

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Functional nano-structuring of thin silicon nitride membranes

Journal of Electrical Engineering

Volume 71 (2020): Issue 2 (April 2020)

By: Milan Matějka, Stanislav Krátký, Tomáš Řiháček, Alexandr Knápek and Vladimír Kolařík

Open Access

|May 2020

Authors

Milan Matějka

milan.matejka@isibrno.cz

Institute of Scientific Instruments of the CAS, Brno

Stanislav Krátký

Institute of Scientific Instruments of the CAS, Brno

Tomáš Řiháček

Institute of Scientific Instruments of the CAS, Brno

Alexandr Knápek

Institute of Scientific Instruments of the CAS, Brno

Vladimír Kolařík

Institute of Scientific Instruments of the CAS, Brno

DOI: https://doi.org/10.2478/jee-2020-0019 | Journal eISSN: 1339-309X | Journal ISSN: 1335-3632

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Language: English

Page range: 127 - 130

Submitted on: Dec 19, 2019

|

Published on: May 13, 2020

Published by: Slovak University of Technology in Bratislava

In partnership with: Paradigm Publishing Services

Publication frequency: 6 issues per year

Keywords:

nano optical device,

electron optics,

electron beam lithography,

silicon nitride,

reactive ion etching,

silicon etching,

microfabrication

Related subjects:

Introductions and overviews,

Engineering, other

© 2020 Milan Matějka, Stanislav Krátký, Tomáš Řiháček, Alexandr Knápek, Vladimír Kolařík, published by Slovak University of Technology in Bratislava
This work is licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 3.0 License.

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